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Journal of the American Chemical Society
|
January 19, 2006
Carboxylic acid chemistry at the Ge(100)-2 x 1 interface: bidentate bridging structure formation on a semiconductor surface
Michael A Filler, James A Van Deventer, Albert J Keung, et al.
Biomedical Microdevices
|
May 12, 2006
A model retinal interface based on directed neuronal growth for single cell stimulation
Neville Z Mehenti, Greg S Tsien, Theodore Leng, et al.
Nano Letters
|
September 13, 2014
Nanoscale limitations in metal oxide electrocatalysts for oxygen evolution
Venkatasubramanian Viswanathan, Katie L Pickrahn, Alan C Luntz, et al.
Advanced Materials (Deerfield Beach, Fla.)
|
August 20, 2025
Role of Precursor Miscibility in Area-Selective Atomic Layer Deposition
Alexander Shearer, Yukio Cho, Andreas Werbrouck, et al.
Langmuir : the ACS Journal of Surfaces and Colloids
|
September 22, 2021
Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition
Tzu-Ling Liu, Li Zeng, Katie L Nardi, et al.
Journal of the American Chemical Society
|
April 11, 2002
Proton transfer reactions on semiconductor surfaces
Collin Mui, Joseph H Han, George T Wang, et al.
Proceedings of the National Academy of Sciences of the United States of America
|
November 12, 2010
Tuning the reactivity of semiconductor surfaces by functionalization with amines of different basicity
Stacey F Bent, Jessica S Kachian, Juan Carlos F Rodríguez-Reyes, et al.
Langmuir : the ACS Journal of Surfaces and Colloids
|
December 15, 2010
Disulfide passivation of the Ge(100)-2 × 1 surface
Jessica S Kachian, John Tannaci, Robert J Wright, et al.
ACS Applied Materials & Interfaces
|
August 19, 2020
Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition
Tzu-Ling Liu, Katie L Nardi, Nerissa Draeger, et al.
ACS Applied Materials & Interfaces
|
September 26, 2025
Effect of Networking Density on the Patterning Performance of Molecular Layer Deposited Alucone Electron Beam/EUV Resists
Long Viet Than, Giulio D'Acunto, Maggy Harake, et al.
Page
of 12
Search research articles
Search
Showing results (51-60 of 113) with videos related to
Sort By:
Page
of 12
Journal of the American Chemical Society
|
January 19, 2006
Carboxylic acid chemistry at the Ge(100)-2 x 1 interface: bidentate bridging structure formation on a semiconductor surface
Michael A Filler, James A Van Deventer, Albert J Keung, et al.
Biomedical Microdevices
|
May 12, 2006
A model retinal interface based on directed neuronal growth for single cell stimulation
Neville Z Mehenti, Greg S Tsien, Theodore Leng, et al.
Nano Letters
|
September 13, 2014
Nanoscale limitations in metal oxide electrocatalysts for oxygen evolution
Venkatasubramanian Viswanathan, Katie L Pickrahn, Alan C Luntz, et al.
Advanced Materials (Deerfield Beach, Fla.)
|
August 20, 2025
Role of Precursor Miscibility in Area-Selective Atomic Layer Deposition
Alexander Shearer, Yukio Cho, Andreas Werbrouck, et al.
Langmuir : the ACS Journal of Surfaces and Colloids
|
September 22, 2021
Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition
Tzu-Ling Liu, Li Zeng, Katie L Nardi, et al.
Journal of the American Chemical Society
|
April 11, 2002
Proton transfer reactions on semiconductor surfaces
Collin Mui, Joseph H Han, George T Wang, et al.
Proceedings of the National Academy of Sciences of the United States of America
|
November 12, 2010
Tuning the reactivity of semiconductor surfaces by functionalization with amines of different basicity
Stacey F Bent, Jessica S Kachian, Juan Carlos F Rodríguez-Reyes, et al.
Langmuir : the ACS Journal of Surfaces and Colloids
|
December 15, 2010
Disulfide passivation of the Ge(100)-2 × 1 surface
Jessica S Kachian, John Tannaci, Robert J Wright, et al.
ACS Applied Materials & Interfaces
|
August 19, 2020
Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition
Tzu-Ling Liu, Katie L Nardi, Nerissa Draeger, et al.
ACS Applied Materials & Interfaces
|
September 26, 2025
Effect of Networking Density on the Patterning Performance of Molecular Layer Deposited Alucone Electron Beam/EUV Resists
Long Viet Than, Giulio D'Acunto, Maggy Harake, et al.
Page
of 12