Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Filters

Uwe D Zeitner

Showing results (21-30 of 27) with videos related to

Pageof 3
Sort By:
You have reached the last page of results.This site can display upto 27 results.
Optics Letters|September 29, 2017
175  nm period grating fabricated by i-line proximity mask-aligner lithographyYannick Bourgin, Daniel Voigt, Thomas Käsebier, et al.
Optics Letters|August 19, 2010
Highly efficient three-level blazed grating in the resonance domainMaria Oliva, Dirk Michaelis, Tino Benkenstein, et al.
Optics Express|February 12, 2014
Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sourcesMarcus Trost, Sven Schröder, Angela Duparré, et al.
Optics Express|July 21, 2015
Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithographyYannick Bourgin, Thomas Siefke, Thomas Käsebier, et al.
Optics Express|November 14, 2024
Mid-infrared dielectric laser acceleration in a silicon dual pillar structureLeon Brückner, Tomáš Chlouba, Yuya Morimoto, et al.
Optics Express|February 1, 2024
Structured illumination ptychography and at-wavelength characterization with an EUV diffuser at 13.5 nm wavelengthWilhelm Eschen, Chang Liu, Michael Steinert, et al.
Optics Express|October 14, 2010
Advanced mask aligner lithography: new illumination systemReinhard Voelkel, Uwe Vogler, Andreas Bich, et al.
Pageof 3

Showing results (21-30 of 27) with videos related to

Sort By:
Pageof 3
You have reached the last page of results.This site can display upto 27 results.
Optics Letters|September 29, 2017
175  nm period grating fabricated by i-line proximity mask-aligner lithographyYannick Bourgin, Daniel Voigt, Thomas Käsebier, et al.
Optics Letters|August 19, 2010
Highly efficient three-level blazed grating in the resonance domainMaria Oliva, Dirk Michaelis, Tino Benkenstein, et al.
Optics Express|February 12, 2014
Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sourcesMarcus Trost, Sven Schröder, Angela Duparré, et al.
Optics Express|July 21, 2015
Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithographyYannick Bourgin, Thomas Siefke, Thomas Käsebier, et al.
Optics Express|November 14, 2024
Mid-infrared dielectric laser acceleration in a silicon dual pillar structureLeon Brückner, Tomáš Chlouba, Yuya Morimoto, et al.
Optics Express|February 1, 2024
Structured illumination ptychography and at-wavelength characterization with an EUV diffuser at 13.5 nm wavelengthWilhelm Eschen, Chang Liu, Michael Steinert, et al.
Optics Express|October 14, 2010
Advanced mask aligner lithography: new illumination systemReinhard Voelkel, Uwe Vogler, Andreas Bich, et al.
Pageof 3