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Xiuguo Chen

Showing results (21-30 of 47) with videos related to

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Applied Optics|October 6, 2021
Unsupervised learning polarimetric underwater image recovery under nonuniform optical fieldsShilong Yang, Bowen Qu, Genshen Liu, et al.
Optics Letters|November 15, 2024
Virtual X-ray critical dimension metrology via Monte Carlo simulationJiahao Zhang, Zhangyong Liu, Weigang Zhou, et al.
Optics Express|April 1, 2020
On the limits of low-numerical-aperture imaging scatterometryCai Wang, Xiuguo Chen, Honggang Gu, et al.
Optics Express|October 7, 2021
Imaging Mueller matrix ellipsometry with sub-micron resolution based on back focal plane scanningChao Chen, Xiuguo Chen, Cai Wang, et al.
Optics Letters|January 31, 2025
Extended eigenvalue calibration method for Mueller matrix polarimetry with four photoelastic modulatorsWenlong Chen, Xiuguo Chen, Yifu Wang, et al.
Optics Letters|June 30, 2023
Multi-spectral snapshot diffraction-based overlay metrologyXiuguo Chen, Jing Hu, Wenlong Chen, et al.
Optics Letters|July 15, 2022
Characterization of pixelated nanogratings in 3D holographic display by an imaging Mueller matrix ellipsometryChao Chen, Xiuguo Chen, Zhongwen Xia, et al.
Optics Letters|September 15, 2021
Eigenvalue calibration method for dual rotating-compensator Mueller matrix polarimetrySheng Sheng, Xiuguo Chen, Chao Chen, et al.
Optics Express|July 1, 2014
Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometryXiuguo Chen, Shiyuan Liu, Chuanwei Zhang, et al.
Optics Express|November 25, 2018
Comprehensive characterization of a general composite waveplate by spectroscopic Mueller matrix polarimetryHonggang Gu, Xiuguo Chen, Yating Shi, et al.
Pageof 5

Showing results (21-30 of 47) with videos related to

Sort By:
Pageof 5
Applied Optics|October 6, 2021
Unsupervised learning polarimetric underwater image recovery under nonuniform optical fieldsShilong Yang, Bowen Qu, Genshen Liu, et al.
Optics Letters|November 15, 2024
Virtual X-ray critical dimension metrology via Monte Carlo simulationJiahao Zhang, Zhangyong Liu, Weigang Zhou, et al.
Optics Express|April 1, 2020
On the limits of low-numerical-aperture imaging scatterometryCai Wang, Xiuguo Chen, Honggang Gu, et al.
Optics Express|October 7, 2021
Imaging Mueller matrix ellipsometry with sub-micron resolution based on back focal plane scanningChao Chen, Xiuguo Chen, Cai Wang, et al.
Optics Letters|January 31, 2025
Extended eigenvalue calibration method for Mueller matrix polarimetry with four photoelastic modulatorsWenlong Chen, Xiuguo Chen, Yifu Wang, et al.
Optics Letters|June 30, 2023
Multi-spectral snapshot diffraction-based overlay metrologyXiuguo Chen, Jing Hu, Wenlong Chen, et al.
Optics Letters|July 15, 2022
Characterization of pixelated nanogratings in 3D holographic display by an imaging Mueller matrix ellipsometryChao Chen, Xiuguo Chen, Zhongwen Xia, et al.
Optics Letters|September 15, 2021
Eigenvalue calibration method for dual rotating-compensator Mueller matrix polarimetrySheng Sheng, Xiuguo Chen, Chao Chen, et al.
Optics Express|July 1, 2014
Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometryXiuguo Chen, Shiyuan Liu, Chuanwei Zhang, et al.
Optics Express|November 25, 2018
Comprehensive characterization of a general composite waveplate by spectroscopic Mueller matrix polarimetryHonggang Gu, Xiuguo Chen, Yating Shi, et al.
Pageof 5