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Applied Optics
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October 6, 2021
Unsupervised learning polarimetric underwater image recovery under nonuniform optical fields
Shilong Yang, Bowen Qu, Genshen Liu, et al.
Optics Letters
|
November 15, 2024
Virtual X-ray critical dimension metrology via Monte Carlo simulation
Jiahao Zhang, Zhangyong Liu, Weigang Zhou, et al.
Optics Express
|
April 1, 2020
On the limits of low-numerical-aperture imaging scatterometry
Cai Wang, Xiuguo Chen, Honggang Gu, et al.
Optics Express
|
October 7, 2021
Imaging Mueller matrix ellipsometry with sub-micron resolution based on back focal plane scanning
Chao Chen, Xiuguo Chen, Cai Wang, et al.
Optics Letters
|
January 31, 2025
Extended eigenvalue calibration method for Mueller matrix polarimetry with four photoelastic modulators
Wenlong Chen, Xiuguo Chen, Yifu Wang, et al.
Optics Letters
|
June 30, 2023
Multi-spectral snapshot diffraction-based overlay metrology
Xiuguo Chen, Jing Hu, Wenlong Chen, et al.
Optics Letters
|
July 15, 2022
Characterization of pixelated nanogratings in 3D holographic display by an imaging Mueller matrix ellipsometry
Chao Chen, Xiuguo Chen, Zhongwen Xia, et al.
Optics Letters
|
September 15, 2021
Eigenvalue calibration method for dual rotating-compensator Mueller matrix polarimetry
Sheng Sheng, Xiuguo Chen, Chao Chen, et al.
Optics Express
|
July 1, 2014
Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry
Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang, et al.
Optics Express
|
November 25, 2018
Comprehensive characterization of a general composite waveplate by spectroscopic Mueller matrix polarimetry
Honggang Gu, Xiuguo Chen, Yating Shi, et al.
Page
of 5
Search research articles
Search
Showing results (21-30 of 47) with videos related to
Sort By:
Page
of 5
Applied Optics
|
October 6, 2021
Unsupervised learning polarimetric underwater image recovery under nonuniform optical fields
Shilong Yang, Bowen Qu, Genshen Liu, et al.
Optics Letters
|
November 15, 2024
Virtual X-ray critical dimension metrology via Monte Carlo simulation
Jiahao Zhang, Zhangyong Liu, Weigang Zhou, et al.
Optics Express
|
April 1, 2020
On the limits of low-numerical-aperture imaging scatterometry
Cai Wang, Xiuguo Chen, Honggang Gu, et al.
Optics Express
|
October 7, 2021
Imaging Mueller matrix ellipsometry with sub-micron resolution based on back focal plane scanning
Chao Chen, Xiuguo Chen, Cai Wang, et al.
Optics Letters
|
January 31, 2025
Extended eigenvalue calibration method for Mueller matrix polarimetry with four photoelastic modulators
Wenlong Chen, Xiuguo Chen, Yifu Wang, et al.
Optics Letters
|
June 30, 2023
Multi-spectral snapshot diffraction-based overlay metrology
Xiuguo Chen, Jing Hu, Wenlong Chen, et al.
Optics Letters
|
July 15, 2022
Characterization of pixelated nanogratings in 3D holographic display by an imaging Mueller matrix ellipsometry
Chao Chen, Xiuguo Chen, Zhongwen Xia, et al.
Optics Letters
|
September 15, 2021
Eigenvalue calibration method for dual rotating-compensator Mueller matrix polarimetry
Sheng Sheng, Xiuguo Chen, Chao Chen, et al.
Optics Express
|
July 1, 2014
Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry
Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang, et al.
Optics Express
|
November 25, 2018
Comprehensive characterization of a general composite waveplate by spectroscopic Mueller matrix polarimetry
Honggang Gu, Xiuguo Chen, Yating Shi, et al.
Page
of 5