Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Filters

Yayi Wei

Showing results (21-30 of 61) with videos related to

Pageof 7
Sort By:
Applied Optics|October 18, 2022
Aberration analysis and compensate method of a BP neural network and sparrow search algorithm in deep ultraviolet lithographyShuang Zhang, Libin Zhang, Tianyang Gai, et al.
Optics Express|September 23, 2025
Aberration model in extreme ultraviolet lithography for device reliabilityJiashuo Wang, Xiaojing Su, Xin Hong, et al.
Applied Optics|September 14, 2023
Fast diffraction model of an EUV mask based on asymmetric patch data fittingZiqi Li, Xuyu Jing, Lisong Dong, et al.
Optics Express|March 18, 2026
Suppressing mask 3D effects in plasmonic lithography via a single high-k wavevector interferenceChuang Wu, Yihua Zhu, Jianfang He, et al.
Optics Express|November 29, 2023
Three-dimensional plasmonic lithography imaging modeling based on the RCWA algorithm for computational lithographyHuwen Ding, Taian Fan, Libin Zhang, et al.
Applied Optics|January 16, 2024
Mask correction method for surface plasmon lithographyLe Ma, Libin Zhang, Jianfang He, et al.
The Journal of Physical Chemistry Letters|August 19, 2024
Convolutional Neural Network-Assisted Photoresist Formulation Discriminator Design of a Contact Layer for Electron Beam LithographyRongbo Zhao, Yayi Wei, Xiaolin Wang, et al.
Applied Optics|August 14, 2020
Analysis and modulation of aberration in an extreme ultraviolet lithography projector via rigorous simulation and a back propagation neural networkRongbo Zhao, Lisong Dong, Chunyue Bo, et al.
Micromachines|November 27, 2025
Analysis of Dynamic Stability Control of Light Source in Immersion DUV LithographyYihua Zhu, Dandan Han, Chuang Wu, et al.
Optics Express|July 30, 2025
Impact of mask errors on imaging quality in surface plasmon lithographyDinghai Rui, LiBin Zhang, Yayi Wei, et al.
Pageof 7

Showing results (21-30 of 61) with videos related to

Sort By:
Pageof 7
Applied Optics|October 18, 2022
Aberration analysis and compensate method of a BP neural network and sparrow search algorithm in deep ultraviolet lithographyShuang Zhang, Libin Zhang, Tianyang Gai, et al.
Optics Express|September 23, 2025
Aberration model in extreme ultraviolet lithography for device reliabilityJiashuo Wang, Xiaojing Su, Xin Hong, et al.
Applied Optics|September 14, 2023
Fast diffraction model of an EUV mask based on asymmetric patch data fittingZiqi Li, Xuyu Jing, Lisong Dong, et al.
Optics Express|March 18, 2026
Suppressing mask 3D effects in plasmonic lithography via a single high-k wavevector interferenceChuang Wu, Yihua Zhu, Jianfang He, et al.
Optics Express|November 29, 2023
Three-dimensional plasmonic lithography imaging modeling based on the RCWA algorithm for computational lithographyHuwen Ding, Taian Fan, Libin Zhang, et al.
Applied Optics|January 16, 2024
Mask correction method for surface plasmon lithographyLe Ma, Libin Zhang, Jianfang He, et al.
The Journal of Physical Chemistry Letters|August 19, 2024
Convolutional Neural Network-Assisted Photoresist Formulation Discriminator Design of a Contact Layer for Electron Beam LithographyRongbo Zhao, Yayi Wei, Xiaolin Wang, et al.
Applied Optics|August 14, 2020
Analysis and modulation of aberration in an extreme ultraviolet lithography projector via rigorous simulation and a back propagation neural networkRongbo Zhao, Lisong Dong, Chunyue Bo, et al.
Micromachines|November 27, 2025
Analysis of Dynamic Stability Control of Light Source in Immersion DUV LithographyYihua Zhu, Dandan Han, Chuang Wu, et al.
Optics Express|July 30, 2025
Impact of mask errors on imaging quality in surface plasmon lithographyDinghai Rui, LiBin Zhang, Yayi Wei, et al.
Pageof 7