Showing results (1-10 of 7) with videos related to
Sort By:
Pageof 1
Optics Express|April 15, 2010
Reflectometer-based metrology for high-aspect ratio via measurementYi-Sha Ku, Fu Shiang YangOptics Express|June 12, 2009
Overlay measurement using angular scatterometer for the capability of integrated metrologyChun-Hung Ko, Yi-Sha KuOptics Express|June 6, 2009
Through-focus technique for nano-scale grating pitch and linewidth analysisYi-Sha Ku, An-Shun Liu, Nigel SmithOptics Express|April 1, 2011
Characterization of high density through silicon vias with spectral reflectometryYi-Sha Ku, Kuo Cheng Huang, Weite HsuOptics Express|June 17, 2009
Scatterometry-based metrology with feature region signatures matchingYi-Sha Ku, Shih-Chun Wang, Deh-Ming Shyu, et al.Optics Express|August 14, 2013
Infrared differential interference contrast microscopy for 3D interconnect overlay metrologyYi-sha Ku, Deh-Ming Shyu, Yeou-Sung Lin, et al.Optics Express|December 2, 2016
EUV scatterometer with a high-harmonic-generation EUV sourceYi-Sha Ku, Chia-Liang Yeh, Yi-Chang Chen, et al.Pageof 1