Joost F W Maas
3PUBLICATIONS
7CO-AUTHORS

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Publications (3)
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|Nov 25, 2024
Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma.Nicholas J Chittock, Joost F W Maas, Ilker Tezsevin
|Mar 15, 2023
Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor.I Tezsevin, J F W Maas, M J M Merkx
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