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Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
Fabrication of nanostructure on a polymer film using atomic force microscope
Subbiah Jegadesan1, Swaminathan Sindhu, Suresh Valiyaveettil
1Department of Chemistry, 3 Science Drive 3, National University of Singapore, Singapore.
Journal of Nanoscience and Nanotechnology
|July 28, 2007
Summary
Researchers fabricated 28 nm nanostructures on polymer films using atomic force microscopy (AFM) and electrostatic nanolithography. This direct method offers a reliable way to create precise nanostructures on materials for nanodevices.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Science
Background:
- Scanning Probe Microscopy (SPM) based lithography enables high-precision nanostructure patterning on diverse substrates.
- Polymer nanostructures are crucial for developing advanced nanodevices.
Purpose of the Study:
- To fabricate nanostructures from polyacrylicacid (PAA) and polymethacrylicacid (PMAA) films on silicon substrates.
- To investigate electrostatic nanolithography for polymer nanopatterning using Atomic Force Microscopy (AFM).
Main Methods:
- Utilized SPM-based techniques, specifically AFM, for nanostructure fabrication.
- Employed electrostatic nanolithography to pattern PAA and PMAA films.
- Optimized nanopatterning by varying applied potential and AFM tip translational speed.
Main Results:
- Successfully fabricated nanostructures with a size of 28 nm on polymethacrylicacid (PMAA) film.
- Demonstrated direct and reliable nanopatterning of polymer films on Si(100) substrates.
- Achieved uniform nanostructures through optimized lithography conditions.
Conclusions:
- AFM-based electrostatic nanolithography is a direct and reliable method for creating uniform nanostructures on polymer films.
- This technique is suitable for fabricating nanostructures from PAA and PMAA for nanodevice applications.
