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Related Experiment Video

Updated: Jun 16, 2026

Correction of Presbyopia by Monocular Bi-Aspheric Ablation Profile

Published on: September 20, 2024

Third-order spherical aberration correction using multistage self-aligned quadrupole correction-lens systems.

Keiji Tamura¹, Shigeo Okayama, Ryuichi Shimizu

¹Department of Information Science, Osaka Institute of Technology, 1-79-1 Kitayama, Hirakata-shi, Osaka Prefecture 573-0196, Japan.

Journal of Electron Microscopy

|January 21, 2010

Summary

New multistage quadrupole lens systems correct spherical aberration in electron beam lithography and focused ion beam systems. These advanced systems offer improved performance with lower excitation levels compared to previous designs.

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Last Updated: Jun 16, 2026

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Published on: February 12, 2013

Area of Science:

Optics and Photonics
Charged Particle Optics

Background:

Spherical aberration limits resolution in probe-forming systems like electron beam lithography (EBL) and focused ion beam (FIB).
Existing correction methods require complex configurations and high excitation levels.

Purpose of the Study:

To propose novel multistage self-aligned quadrupole correction-lens systems for spherical aberration correction.
To investigate the performance of six- and eight-stage systems compared to a four-stage system.

Main Methods:

Development of multistage electrostatic quadrupole and aperture electrode systems.
Simulation of optical properties using approximated potential functions from 3D potential distributions.
Comparison of six- and eight-stage systems with a four-stage system.

Main Results:

Six- and eight-stage systems automatically generate aligned octupole fields for aberration correction.
Aperture aberration coefficients are significantly reduced in the six- and eight-stage systems.
Effective spherical aberration correction is achieved with lower lens element excitation.

Conclusions:

Multistage self-aligned quadrupole correction-lens systems offer a superior solution for spherical aberration in probe-forming instruments.
These systems provide enhanced performance and efficiency, enabling higher resolution imaging and fabrication.