Related Experiment Video
Updated: May 29, 2026
07:51
Fabrication of Silica Ultra High Quality Factor Microresonators
Published on: July 2, 2012
High Q silica microbubble resonators fabricated by arc discharge
S Berneschi1, D Farnesi, F Cosi
1Centro Studi e Ricerche E. Fermi, Rome, Italy. s.berneschi@ifac.cnr.it
Optics Letters
|September 3, 2011
Summary
This study presents an improved method for fabricating microbubble resonators, achieving high Q factors for sensitive refractive index sensing. The new technique ensures stable, high-performance resonators for microfluidic applications.
Area of Science:
- Optics and Photonics
- Microfluidics
- Sensor Technology
Background:
- Microbubble resonators integrate whispering gallery mode resonators with microfluidics.
- Existing fabrication methods may lack homogeneity and precise control.
Purpose of the Study:
- To present an improved fabrication method for microbubble resonators.
- To demonstrate their high Q factors and refractive index sensing capabilities.
Main Methods:
- Utilizing a rotating arc discharge to heat a pressurized capillary.
- Ensuring homogeneous heat distribution via electrode rotation.
- Testing with water and ethanol solutions for sensing.
Main Results:
- Achieved Q factors up to 6×10^7 at 1550 nm.
- Demonstrated refractive index sensing capabilities with aqueous solutions.
- Exhibited good temporal stability in sensor performance.
Conclusions:
- The improved fabrication method yields high-performance microbubble resonators.
- These resonators are suitable for sensitive and stable refractive index sensing.
- The limit of detection is as low as 10^-6 RIU.
