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Targeted Studies Using Serial Block Face and Focused Ion Beam Scan Electron Microscopy
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Annular Focused Electron/Ion Beams for Combining High Spatial Resolution with High Probe Current.

Anjam Khursheed1, Wei Kean Ang1

  • 1Department of Electrical and Computer Engineering,National University of Singapore,4 Engineering Drive 3,Singapore 117576,Singapore.

Microscopy and Microanalysis : the Official Journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada
|September 10, 2016
PubMed
Summary
This summary is machine-generated.

This study proposes an annular aperture and lens corrector to significantly reduce the final probe size in focused electron/ion beam columns. This innovation promises a 50x smaller spot size for high-current applications like lithography.

Keywords:
aberration correctionannular focused electron/ion beamscore lensesfocused electron/ion beam columnsobjective lens

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Area of Science:

  • Physics
  • Materials Science
  • Nanotechnology

Background:

  • Focused electron and ion beam columns often use large final apertures for high primary beam current.
  • Applications like electron beam lithography and spectroscopy require high resolution, which is limited by probe size.
  • Conventional hole apertures in these systems contribute to geometric aberrations, limiting spot size.

Purpose of the Study:

  • To propose a novel method for reducing the final probe size in focused electron/ion beam columns operating at high primary beam currents.
  • To enhance the resolution capabilities of systems used in electron beam lithography, focused ion beams, and electron beam spectroscopy.
  • To mitigate the impact of geometric aberrations in objective lenses for improved beam focusing.

Main Methods:

  • Introduction of an annular aperture to create a ring-shaped primary beam, replacing the conventional hole aperture.
  • Integration of a specialized lens corrector unit designed to eliminate first- and second-order geometric aberrations.
  • Utilization of direct ray tracing simulations to verify the aberration correction capabilities of a three-stage core lens corrector for an electric Einzel objective lens.

Main Results:

  • The proposed system, using an annular aperture and corrector, is predicted to achieve a final geometric aberration limited spot size approximately 50 times smaller than conventional hole-aperture beams.
  • The corrector unit effectively eliminates first- and second-order geometric aberrations of the objective lens.
  • Ray tracing simulations confirm the efficacy of a three-stage core lens corrector in correcting aberrations for an electric Einzel objective lens.

Conclusions:

  • The proposed annular aperture and lens corrector system offers a significant advancement in reducing probe size for high-current focused electron/ion beam applications.
  • This method holds the potential to substantially improve resolution in critical applications such as electron beam lithography and spectroscopy.
  • The design provides a viable pathway to overcome the limitations imposed by geometric aberrations in conventional beam column designs.