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Preparation and Characterization of C60/Graphene Hybrid Nanostructures
Published on: May 15, 2018
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Sublimation-assisted graphene transfer technique based on small polyaromatic hydrocarbons.
Mingguang Chen1,2, Dejan Stekovic2,3, Wangxiang Li2,3
1Department of Chemical and Environmental Engineering, University of California, Riverside, CA 92521, United States of America.
Nanotechnology
|May 13, 2017
Summary
A new naphthalene-assisted method enables residue-free transfer of chemical vapor deposition (CVD) graphene onto various substrates. This technique is ideal for sensitive applications requiring ultraclean graphene and mild transfer conditions.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Chemistry
Background:
- Chemical vapor deposition (CVD) is advancing graphene applications in electronics and energy.
- Current polymer-assisted transfer methods use harsh solvents or heat, limiting use on plastic substrates.
- A need exists for ultraclean, mild graphene transfer techniques.
Purpose of the Study:
- To develop and demonstrate a novel naphthalene-assisted graphene transfer method.
- To achieve residue-free graphene transfer under mild conditions.
- To assess the quality and performance of transferred graphene for device applications.
Main Methods:
- Graphene grown by CVD was transferred using a naphthalene-assisted technique.
- Characterization involved atomic force microscopy, scanning electron microscopy, and Raman spectroscopy.
- Field-effect transistors were fabricated using naphthalene-transferred graphene.
Main Results:
- The naphthalene-assisted method enabled reliable, residue-free transfer of graphene to hard and flexible substrates.
- Characterization confirmed the high quality of the transferred graphene.
- Fabricated field-effect transistors demonstrated the viability of this transfer method.
Conclusions:
- Naphthalene-assisted transfer offers a mild and effective route for high-quality graphene transfer.
- This technique expands the applicability of CVD graphene to sensitive substrates and devices.
- The method is promising for applications demanding ultraclean graphene and gentle processing.
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