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Highly Stable Thin-Film Transistors Based on Indium Oxynitride Semiconductor
Hyoung-Do Kim, Jong Heon Kim, Kyung Park1
1School of Integrated Technology , Yonsei University , Incheon 21983 , Republic of Korea.
ACS Applied Materials & Interfaces
|April 19, 2018
Summary
Indium oxynitride (InON) semiconductor films show enhanced stability in air and under stress. These findings are crucial for developing more robust thin-film transistors (TFTs).
Area of Science:
- Materials Science
- Semiconductor Physics
- Thin-Film Technology
Background:
- Indium oxide (In2O3) and zinc oxynitride (ZnON) are used in semiconductor applications.
- Understanding the properties of oxynitride semiconductors is key for advanced electronic devices.
Purpose of the Study:
- To investigate the properties of indium oxynitride (InON) semiconductor films.
- To evaluate the performance and stability of InON-based thin-film transistors (TFTs).
Main Methods:
- Reactive radio frequency sputtering for InON film growth.
- Experimental characterization and theoretical calculations (Density Functional Theory).
- X-ray photoelectron spectroscopy (XPS) for film analysis.
Main Results:
- InON films demonstrate high stability in air.
- InON TFTs exhibit superior stability under negative bias illumination stress compared to In2O3 and ZnON.
- Nitrogen incorporation in In2O3 reduces oxygen-deficient regions, shifting the valence band maximum upwards.
- Lower formation energy of InN explains the enhanced stability of InON over ZnON.
Conclusions:
- InON is a promising semiconductor material for stable electronic devices.
- The enhanced stability of InON is attributed to reduced oxygen vacancies and favorable In-N bonding energetics.
- InON-based TFTs represent a significant advancement in device stability for demanding applications.
Keywords:
Indium oxynitride (InON)air stabilitydensity functional theory (DFT)first principle calculationnegative bias illumination stress (NBIS)thin-film transistorMore Related Videos
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