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Updated: Jan 24, 2026

Scanning-probe Single-electron Capacitance Spectroscopy
Published on: July 30, 2013
Comparative Study of Negative Capacitance Field-Effect Transistors with Different MOS Capacitances
Jing Li1, Yan Liu2, Genquan Han3
1State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an, 710071, People's Republic of China.
Abstract:
We demonstrate the negative capacitance (NC) effect of HfZrOx-based field-effect transistors (FETs) in the experiments. Improved IDS, SS, and Gm of NCFET have been achieved in comparison with control metal oxide semiconductor (MOS) FET. In this experiment, the bottom MIS transistors with different passivation time are equivalent to the NC devices with different MOS capacitances. Meanwhile, the electrical properties of NCFET with 40 min passivation are superior to that of NCFET with 60 min passivation owing to the good matching between CFE and CMOS. Although SS of sub-60 mV/decade is not achieved, the non-hysteretic transfer characteristics beneficial to the logic applications are obtained.
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