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In situ infrared spectroscopy during La2O3 ALD using La( i PrCp)3 and H2O

Brent A Sperling1, James E Maslar1, Sergei V Ivanov2

  • 1National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, MD 20899, USA.

Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films : an Official Journal of the American Vacuum Society
|March 20, 2020
PubMed

Keywords:
atomic layer depositioninfrared spectroscopylanthanum oxide

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