Embracing Uncertainty: Modeling Uncertainty in EPMA-Part II

Nicholas W M Ritchie1

  • 1Surface and Microanalysis Science, NIST, Gaithersburg, MD 20899, USA.

Summary

This study introduces a new framework for calculating uncertainty in electron excited X-ray microanalysis, applying it to the Pouchou and Pichoir Simplified Model (XPP) for matrix correction. It considers various parameters to improve measurement accuracy and design.

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