Gate-Tunable Anomalous Hall Effect in a 3D Topological Insulator/2D Magnet van der Waals Heterostructure

Vishakha Gupta1, Rakshit Jain1, Yafei Ren2

  • 1Cornell University, Ithaca, New York 14850, United States.

Nano Letters
|August 22, 2022
PubMed
Summary

Researchers controlled topological surface states in a 3D topological insulator (TI) using mechanical stacking. They tuned the anomalous Hall effect (AHE) with gate voltage, revealing insights into TI-magnet interactions.

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