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Related Experiment Video

Updated: Aug 8, 2025

Atomically Traceable Nanostructure Fabrication

Atomically Traceable Nanostructure Fabrication

Published on: July 17, 2015

Atom-by-Atom Direct Writing.

Ondrej Dyck¹, Andrew R Lupini¹, Stephen Jesse¹

¹Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, United States.

|March 6, 2023

Summary

This summary is machine-generated.

Researchers developed a novel atom-by-atom direct writing technique using an electron beam to precisely place tin atoms onto graphene. This method creates defects and uses temperature control for controlled material deposition, advancing nanoscale fabrication.

Keywords:

atomic manipulation direct-write electron beam scanning transmission electron microscope

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Writing and Low-Temperature Characterization of Oxide Nanostructures

Writing and Low-Temperature Characterization of Oxide Nanostructures

Published on: July 18, 2014

Area of Science:

Materials Science
Nanotechnology
Electron Microscopy

Background:

Direct-write processes allow sequential material deposition.
Conventional electron-beam-induced deposition relies on gas precursor dissociation.
A new method is needed for precise, atom-level material placement.

Purpose of the Study:

To demonstrate a novel electron beam direct-write process for atom-by-atom material deposition.
To utilize point defect generation and surface migration for controlled material assembly.
To establish a new fabrication technique at the nanoscale.

Main Methods:

Utilized an aberration-corrected scanning transmission electron microscope.
Employed an atomic-sized electron beam to create point defects in graphene.
Used elemental tin (Sn) as a precursor material.
Controlled sample temperature to facilitate tin atom migration and bonding to defect sites.

Main Results:

Successfully demonstrated direct writing of tin atoms onto a graphene substrate.
Achieved atom-by-atom deposition by generating and utilizing point defects.
Established a mechanism distinct from conventional electron-beam-induced deposition.

Conclusions:

The developed electron beam direct-write process enables precise, sequential material deposition at the atomic scale.
This technique offers a new pathway for nanoscale fabrication and material assembly.
The findings pave the way for advanced nanodevices and tailored material structures.