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Low-Ohmic Resistance Comparison: Measurement Capabilities and Resistor Traveling Behavior
Gert Rietveld1, Jan H N van der Beek1, Marlin Kraft2
1Van Swinden Laboratorium, the National Metrology Institute of The Netherlands, 2600 AR Delft, The Netherlands.
Summary
Low-ohmic resistance measurements at three national metrology institutes showed excellent agreement. Careful resistor transport was key, though some resistance elements exhibited value shifts during handling.
Area of Science:
- Metrology
- Electrical Engineering
- Materials Science
Background:
- Accurate low-ohmic resistance measurements are critical for various scientific and industrial applications.
- Interlaboratory comparisons are essential for validating measurement capabilities and ensuring traceability.
Purpose of the Study:
- To compare the low-ohmic resistance measurement capabilities of three national metrology institutes.
- To assess the agreement of measurements for resistors in the range of 100 mΩ to 100 μΩ.
Main Methods:
- A set of low-ohmic resistors (100 mΩ, 10 mΩ, 1 mΩ, 100 μΩ) were circulated among three laboratories: Van Swinden Laboratorium, National Institute of Standards and Technology, and METAS.
- Measurement results were compared against a comparison reference value, considering respective measurement uncertainties.
Main Results:
- Measurement results from the three laboratories demonstrated excellent agreement within their stated uncertainties.
- Some resistors exhibited discrete changes in resistance value after each transport, suggesting a link to their construction.
Conclusions:
- The intercomparison confirms the high accuracy of low-ohmic resistance measurements at the participating national metrology institutes.
- The observed resistance shifts highlight the importance of resistor construction and handling in precise low-ohmic measurements.
Keywords:
Comparisonlow-ohmic measurementsprecision measurementsresistance measurementsresistorsshuntstraveling behaviorMore Related Videos
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