High Pressure Resistance in Omniphobic Distillation Membranes with Re-entrant Nanostructures

We developed pressure-resistant omniphobic membranes that enable stable distillation of low-surface-tension liquids at applied pressures exceeding 15 bar. Membranes were synthesized by grafting re-entrant nanostructures onto porous alumina membranes, followed by hydrophobic modification. The membranes exhibited a high liquid entry pressure of 36.2 bar with water and withstood an applied pressure up to 15.5 bar with a low-surface-tension 15 wt % ethanol-water mixture. Simulations revealed that the enhanced wetting resistance is due to the presence of re-entrant structures, which facilitated a 220% increase in wetting pressure for the low-surface-tension liquid compared to a control membrane with cylindrical pores. We further demonstrated stable pressure-driven distillation of low-surface-tension liquids, achieving higher than 97% salt rejection. This work is the first demonstration of distillation membranes operating with low-surface-tension liquids under high applied pressures and provides critical validation of wettability theory under extreme pressures.