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Applied Optics|May 22, 2010
Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask imageBo Peng, Xiangzhao Wang, Zicheng Qiu, et al.Optics Letters|May 4, 2010
Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imagingBo Peng, Xiangzhao Wang, Zicheng Qiu, et al.Applied Optics|February 23, 2023
Phase defect characterization using generative adversarial networks for extreme ultraviolet lithographyHang Zheng, Sikun Li, Wei Cheng, et al.Optics Letters|May 4, 2005
Intensity-modulating characteristics of a laser diode subjected to optical injectionXiangzhao Wang, Yingming Liu, Hongbin Lu, et al.Optics Express|March 18, 2022
Optical coherence elastography to evaluate depth-resolved elasticity of tissueChenming Yang, Zhen Xiang, Zhongliang Li, et al.Applied Optics|February 13, 2013
Full-range parallel Fourier-domain optical coherence tomography using a spatial carrier frequencyBingjie Huang, Peng Bu, Xiangzhao Wang, et al.Optics Express|March 17, 2021
Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithmZinan Zhang, Sikun Li, Xiangzhao Wang, et al.Journal of the Optical Society of America. A, Optics, Image Science, and Vision|June 10, 2026
OCT sidelobe suppression method based on dual-path phase sinusoidal modulation and minimum value fusionTeng Liu, Zhongliang Li, Nan Nan, et al.Optics Express|September 22, 2011
In situ aberration measurement technique based on principal component analysis of aerial imageLifeng Duan, Xiangzhao Wang, Anatoly Y Bourov, et al.Applied Optics|February 7, 2007
Calibration method for a photoelastic modulator with a peak retardation of less than a half-wavelengthAijun Zeng, Lihua Huang, Zuoren Dong, et al.Pageof 1,050