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Optics Express
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June 11, 2024
Inverse optical scatterometry using sketch-guided deep learning
Shuo Liu, Xiuguo Chen, Tianjuan Yang, et al.
Journal of the Optical Society of America. A, Optics, Image Science, and Vision
|
December 15, 2017
Reduced-basis boundary element method for fast electromagnetic field computation
Yating Shi, Xiuguo Chen, Yinyin Tan, et al.
Optics Letters
|
June 15, 2019
Wide field-of-view angle linear retarder with an ultra-flat retardance response
Honggang Gu, Xiuguo Chen, Hao Jiang, et al.
Optics Express
|
July 21, 2015
Mueller matrix imaging ellipsometry for nanostructure metrology
Shiyuan Liu, Weichao Du, Xiuguo Chen, et al.
Optics Express
|
April 26, 2017
Robust overlay metrology with differential Mueller matrix calculus
Xiuguo Chen, Honggang Gu, Hao Jiang, et al.
Optics Letters
|
February 14, 2015
Improved deep-etched multilayer grating reconstruction by considering etching anisotropy and abnormal errors in optical scatterometry
Jinlong Zhu, Shiyuan Liu, Hao Jiang, et al.
Optics Express
|
October 19, 2017
Optimal polarization modulation for orthogonal two-axis Lloyd's mirror interference lithography
Xiuguo Chen, Zongwei Ren, Yuki Shimizu, et al.
Optics Express
|
October 19, 2017
Self-calibration of Fizeau interferometer and planar scale gratings in Littrow setup
Xiuguo Chen, Yuki Shimizu, Xin Xiong, et al.
Applied Optics
|
July 14, 2016
Accurate alignment of optical axes of a biplate using a spectroscopic Mueller matrix ellipsometer
Honggang Gu, Xiuguo Chen, Hao Jiang, et al.
The Review of Scientific Instruments
|
August 3, 2018
Development of a tomographic Mueller-matrix scatterometer for nanostructure metrology
Yinyin Tan, Chao Chen, Xiuguo Chen, et al.
Page
of 5
Search research articles
Search
Showing results (11-20 of 47) with videos related to
Sort By:
Page
of 5
Optics Express
|
June 11, 2024
Inverse optical scatterometry using sketch-guided deep learning
Shuo Liu, Xiuguo Chen, Tianjuan Yang, et al.
Journal of the Optical Society of America. A, Optics, Image Science, and Vision
|
December 15, 2017
Reduced-basis boundary element method for fast electromagnetic field computation
Yating Shi, Xiuguo Chen, Yinyin Tan, et al.
Optics Letters
|
June 15, 2019
Wide field-of-view angle linear retarder with an ultra-flat retardance response
Honggang Gu, Xiuguo Chen, Hao Jiang, et al.
Optics Express
|
July 21, 2015
Mueller matrix imaging ellipsometry for nanostructure metrology
Shiyuan Liu, Weichao Du, Xiuguo Chen, et al.
Optics Express
|
April 26, 2017
Robust overlay metrology with differential Mueller matrix calculus
Xiuguo Chen, Honggang Gu, Hao Jiang, et al.
Optics Letters
|
February 14, 2015
Improved deep-etched multilayer grating reconstruction by considering etching anisotropy and abnormal errors in optical scatterometry
Jinlong Zhu, Shiyuan Liu, Hao Jiang, et al.
Optics Express
|
October 19, 2017
Optimal polarization modulation for orthogonal two-axis Lloyd's mirror interference lithography
Xiuguo Chen, Zongwei Ren, Yuki Shimizu, et al.
Optics Express
|
October 19, 2017
Self-calibration of Fizeau interferometer and planar scale gratings in Littrow setup
Xiuguo Chen, Yuki Shimizu, Xin Xiong, et al.
Applied Optics
|
July 14, 2016
Accurate alignment of optical axes of a biplate using a spectroscopic Mueller matrix ellipsometer
Honggang Gu, Xiuguo Chen, Hao Jiang, et al.
The Review of Scientific Instruments
|
August 3, 2018
Development of a tomographic Mueller-matrix scatterometer for nanostructure metrology
Yinyin Tan, Chao Chen, Xiuguo Chen, et al.
Page
of 5