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Yijiang Shen

Optics express

Showing results (1-10 of 9) with videos related to

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Optics Express|May 3, 2018
Lithographic source and mask optimization with narrow-band level-set methodYijiang Shen
Optics Express|October 19, 2017
Level-set based mask synthesis with a vector imaging modelYijiang Shen
Optics Express|January 31, 2019
Efficient optical proximity correction based on semi-implicit additive operator splittingYijiang Shen, Fei Peng, Zhenrong Zhang
Optics Express|November 6, 2019
Semi-implicit level set formulation for lithographic source and mask optimizationYijiang Shen, Fei Peng, Zhenrong Zhang
Optics Express|April 6, 2021
Fast implicit active contour model for inverse lithographyYijiang Shen, Yanzhou Zhou, Zhenrong Zhang
Optics Express|January 7, 2010
Level-set-based inverse lithography for photomask synthesisYijiang Shen, Ngai Wong, Edmund Y Lam
Optics Express|October 6, 2012
Hotspot-aware fast source and mask optimizationJia Li, Yijiang Shen, Edmund Y Lam
Optics Express|March 30, 2011
Robust level-set-based inverse lithographyYijiang Shen, Ningning Jia, Ngai Wong, et al.
Optics Express|September 23, 2025
Enforcement of curvy MRC compliance with reduced complexity in inverse lithographyXiaoxuan Liu, Yuhang Wang, Peixian Zheng, et al.
Pageof 1

Showing results (1-10 of 9) with videos related to

Sort By:
Pageof 1
Optics Express|May 3, 2018
Lithographic source and mask optimization with narrow-band level-set methodYijiang Shen
Optics Express|October 19, 2017
Level-set based mask synthesis with a vector imaging modelYijiang Shen
Optics Express|January 31, 2019
Efficient optical proximity correction based on semi-implicit additive operator splittingYijiang Shen, Fei Peng, Zhenrong Zhang
Optics Express|November 6, 2019
Semi-implicit level set formulation for lithographic source and mask optimizationYijiang Shen, Fei Peng, Zhenrong Zhang
Optics Express|April 6, 2021
Fast implicit active contour model for inverse lithographyYijiang Shen, Yanzhou Zhou, Zhenrong Zhang
Optics Express|January 7, 2010
Level-set-based inverse lithography for photomask synthesisYijiang Shen, Ngai Wong, Edmund Y Lam
Optics Express|October 6, 2012
Hotspot-aware fast source and mask optimizationJia Li, Yijiang Shen, Edmund Y Lam
Optics Express|March 30, 2011
Robust level-set-based inverse lithographyYijiang Shen, Ningning Jia, Ngai Wong, et al.
Optics Express|September 23, 2025
Enforcement of curvy MRC compliance with reduced complexity in inverse lithographyXiaoxuan Liu, Yuhang Wang, Peixian Zheng, et al.
Pageof 1