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Yung-Chun Wu

Showing results (1-10 of 11) with videos related to

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Materials (Basel, Switzerland)|November 8, 2017
Ultra Thin Poly-Si Nanosheet Junctionless Field-Effect Transistor with Nickel Silicide ContactYu-Ru Lin, Wan-Ting Tsai, Yung-Chun Wu, et al.
Journal of Nanoscience and Nanotechnology|March 14, 2012
Fabrication and characterization of twin poly-Si thin film transistors EEPROM with a nitride charge trapping layerMin-Feng Hung, Yung-Chun Wu, Ji-Hong Chiang, et al.
International Journal of Medical Sciences|January 2, 2025
Ginsenosides, salidroside, and syringin complex exhibits anti-fatigue in exhaustive exercise ratsYung-Chun Wu, Yu Zhi Lian, Hongwei Zhao, et al.
Nanomaterials (Basel, Switzerland)|July 9, 2022
Trench FinFET Nanostructure with Advanced Ferroelectric Nanomaterial HfZrO<sub>2</sub> for Sub-60-mV/Decade Subthreshold Slope for Low Power ApplicationSiao-Cheng Yan, Chen-Han Wu, Chong-Jhe Sun, et al.
Nanoscale Research Letters|June 20, 2015
Characterizing the electrical properties of raised S/D junctionless thin-film transistors with a dual-gate structureYa-Chi Cheng, Hung-Bin Chen, Jun-Ji Su, et al.
Nanomaterials (Basel, Switzerland)|October 27, 2022
Threshold Voltage Adjustment by Varying Ge Content in SiGe p-Channel for Single Metal Shared Gate Complementary FET (CFET)Chong-Jhe Sun, Chen-Han Wu, Yi-Ju Yao, et al.
Nanoscale Research Letters|July 24, 2013
Fabrication, characterization and simulation of Ω-gate twin poly-Si FinFET nonvolatile memoryMu-Shih Yeh, Yung-Chun Wu, Min-Feng Hung, et al.
Nanoscale Research Letters|August 23, 2014
Temperature dependence of electronic behaviors in quantum dimension junctionless thin-film transistorYa-Chi Cheng, Hung-Bin Chen, Ming-Hung Han, et al.
Nanoscale Research Letters|November 19, 2014
A single poly-Si gate-all-around junctionless fin field-effect transistor for use in one-time programming nonvolatile memoryMu-Shih Yeh, Yung-Chun Wu, Kuan-Cheng Liu, et al.
Materials (Basel, Switzerland)|May 7, 2025
Super High-k Dielectric via Composition-Dependent Hafnium Zirconium Oxide Superlattice for Si Nanosheet Gate-All-Around Field-Effect Transistors with NH<sub>3</sub> Plasma-Optimized InterfacesYi-Ju Yao, Yu-Min Fu, Yu-Hung Chen, et al.
Pageof 2

Showing results (1-10 of 11) with videos related to

Sort By:
Pageof 2
Materials (Basel, Switzerland)|November 8, 2017
Ultra Thin Poly-Si Nanosheet Junctionless Field-Effect Transistor with Nickel Silicide ContactYu-Ru Lin, Wan-Ting Tsai, Yung-Chun Wu, et al.
Journal of Nanoscience and Nanotechnology|March 14, 2012
Fabrication and characterization of twin poly-Si thin film transistors EEPROM with a nitride charge trapping layerMin-Feng Hung, Yung-Chun Wu, Ji-Hong Chiang, et al.
International Journal of Medical Sciences|January 2, 2025
Ginsenosides, salidroside, and syringin complex exhibits anti-fatigue in exhaustive exercise ratsYung-Chun Wu, Yu Zhi Lian, Hongwei Zhao, et al.
Nanomaterials (Basel, Switzerland)|July 9, 2022
Trench FinFET Nanostructure with Advanced Ferroelectric Nanomaterial HfZrO<sub>2</sub> for Sub-60-mV/Decade Subthreshold Slope for Low Power ApplicationSiao-Cheng Yan, Chen-Han Wu, Chong-Jhe Sun, et al.
Nanoscale Research Letters|June 20, 2015
Characterizing the electrical properties of raised S/D junctionless thin-film transistors with a dual-gate structureYa-Chi Cheng, Hung-Bin Chen, Jun-Ji Su, et al.
Nanomaterials (Basel, Switzerland)|October 27, 2022
Threshold Voltage Adjustment by Varying Ge Content in SiGe p-Channel for Single Metal Shared Gate Complementary FET (CFET)Chong-Jhe Sun, Chen-Han Wu, Yi-Ju Yao, et al.
Nanoscale Research Letters|July 24, 2013
Fabrication, characterization and simulation of Ω-gate twin poly-Si FinFET nonvolatile memoryMu-Shih Yeh, Yung-Chun Wu, Min-Feng Hung, et al.
Nanoscale Research Letters|August 23, 2014
Temperature dependence of electronic behaviors in quantum dimension junctionless thin-film transistorYa-Chi Cheng, Hung-Bin Chen, Ming-Hung Han, et al.
Nanoscale Research Letters|November 19, 2014
A single poly-Si gate-all-around junctionless fin field-effect transistor for use in one-time programming nonvolatile memoryMu-Shih Yeh, Yung-Chun Wu, Kuan-Cheng Liu, et al.
Materials (Basel, Switzerland)|May 7, 2025
Super High-k Dielectric via Composition-Dependent Hafnium Zirconium Oxide Superlattice for Si Nanosheet Gate-All-Around Field-Effect Transistors with NH<sub>3</sub> Plasma-Optimized InterfacesYi-Ju Yao, Yu-Min Fu, Yu-Hung Chen, et al.
Pageof 2