Hong Yang
7PUBLICATIONS
13CO-AUTHORS
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Publications (7)
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|May 24, 2024
CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology.Henry H Radamson, Yuanhao Miao, Ziwei Zhou
|Apr 13, 2023
Insight into over Repair of Hot Carrier Degradation by GIDL Current in Si p-FinFETs Using Ultra-Fast Measurement Technique.Hao Chang, Guilei Wang, Hong Yang
|Apr 03, 2021
Optimization of Structure and Electrical Characteristics for Four-Layer Vertically-Stacked Horizontal Gate-All-Around Si Nanosheets Devices.Qingzhu Zhang, Jie Gu, Renren Xu
|Aug 14, 2020
State of the Art and Future Perspectives in Advanced CMOS Technology.Henry H Radamson, Huilong Zhu, Zhenhua Wu
|Apr 25, 2020
Study of Silicon Nitride Inner Spacer Formation in Process of Gate-all-around Nano-Transistors.Junjie Li, Yongliang Li, Na Zhou
|Feb 13, 2020
A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm.Junjie Li, Yongliang Li, Na Zhou
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