Atomic characterization of Si nanoclusters embedded in SiO2 by atom probe tomography

Manuel Roussel1, Etienne Talbot, Fabrice Gourbilleau

  • 1Groupe de Physique des Matériaux, Université et INSA de Rouen, UMR CNRS 6634, Av, de l'université, BP 12, 76801 Saint Etienne du Rouvray, France. manuel.roussel@etu.univ-rouen.fr.

Summary

Atom probe tomography reveals atomic-level details of silicon nanoclusters within silicon oxide/silicon dioxide multilayers. This advanced technique complements traditional methods for characterizing nanostructural properties crucial for optoelectronics.

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