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Updated: May 29, 2026
06:58
Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
Published on: July 12, 2016
Charge state dependent energy deposition by ion impact
R E Lake1, J M Pomeroy, H Grube
1Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA. russell.lake@nist.gov
Physical Review Letters
|September 10, 2011
Summary
We measured craters in dielectric films created by xenon ion impacts. Crater depth and electrical conductance increased with ion charge, revealing energy deposition during impact.
Area of Science:
- Materials Science
- Surface Science
- Ion-Solid Interactions
Background:
- Ion bombardment can create surface modifications like craters.
- Dielectric films are crucial in electronic devices.
- Understanding ion-induced damage is vital for material stability.
Purpose of the Study:
- To quantify crater formation in thin dielectric films.
- To investigate the relationship between projectile charge state and crater characteristics.
- To determine the energy deposition during ion impact.
Main Methods:
- Utilized tunnel junction devices with ion-irradiated barriers.
- Measured electrical conductance changes as a function of projectile charge (Q).
- Applied a heated spike model to estimate crater energy.
Main Results:
- Electrical conductance increased by 4 orders of magnitude with increasing Xe ion charge (Q).
- Crater depths ranged from 2 to 11 Å.
- Energy required for crater formation was 8–25 keV.
- At least 27% of projectile neutralization energy was deposited into the film.
Conclusions:
- Projectile charge state significantly influences crater formation in dielectric films.
- The study provides insights into energy deposition mechanisms during ion-solid interactions.
- Results are relevant for understanding radiation effects in thin films.
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