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Published on: May 13, 2020
TaOx-based resistive switching memories: prospective and challenges.
Amit Prakash1, Debanjan Jana, Siddheswar Maikap
1Thin Film Nano Technology Laboratory, Department of Electronic Engineering, Chang Gung University, Tao-Yuan 333, Taiwan. sidhu@mail.cgu.edu.tw.
Tantalum oxide (TaOx) resistive switching memories (RRAMs) show promise for low-current applications. This review explores TaOx RRAMs, highlighting challenges in achieving reliable performance at very low operating currents (few microamperes).
Area of Science:
- Materials Science
- Nanoscience
- Electrical Engineering
Background:
- Resistive switching memories (RRAMs) are a promising alternative to conventional flash memory.
- Low-current operation (<100 μA) is crucial for productive RRAM applications.
- Tantalum oxide (TaOx) exhibits two stable phases (TaO2 and Ta2O5) enabling controllable resistance states.
Purpose of the Study:
- To investigate the switching mode, mechanism, and performance of low-current operated TaOx-based RRAM devices.
- To compare the characteristics of low-current TaOx RRAMs with other RRAM devices.
- To address the challenges in reducing operating current for RRAM production.
Main Methods:
- Topical review of published literature on TaOx-based RRAMs.
- Analysis of switching characteristics at various current compliance levels.
- Evaluation of endurance, data retention, and operating mechanisms.
Main Results:
- TaOx RRAMs demonstrate potential for low-current operation, but performance degrades significantly at very low current compliance (e.g., 10 μA).
- Existing TaOx RRAM structures (bilayered or single-layer with specific electrodes) show acceptable memory characteristics at 80 μA.
- Achieving stable and reliable operation at few microamperes remains a significant challenge.
Conclusions:
- TaOx is a viable material for RRAM, but further research is needed to overcome challenges in low-current operation.
- Understanding the switching mechanism is key to optimizing TaOx RRAMs for microampere current levels.
- This review provides insights for the application and future production of nanoscale TaOx RRAM devices.
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