A New Approach for Dimensional Optimization of Inverters in 6T-Static Random-Access Memory Cell Based on Silicon...

This study explores dimensional optimization at different high logic-level voltages for six silicon nanowire transistor (SiNWT)-based static random-access memory (SRAM) cell. This study is the first to demonstrate diameter and length of nanowires with different logic voltage level (V dd optimizations of nanoscale SiNWT-based SRAM cell. Noise margins and inflection voltage of butterfly characteristics are used as limiting factors in this optimization. Results indicate that optimization depends on nanowire dimensions and V dd. The increase in V dd from 1 V to 3 V tends to decrease the dimensions of the optimized nanowires but increases the current and power. SRAM using nanowire transistors must use V dd of 2 or 2.5 V to produce SRAM with lower dimensions, inflection currents, and power consumption.