Synergistic Approach of Interfacial Layer Engineering and READ-Voltage Optimization in HfO2-Based FeFETs for

Yannick Raffel1, Sourav De1, Maximilian Lederer1

  • 1Fraunhofer-Institut für Photonische Mikrosysteme IPMS - Center Nanoelectronic Technologies, Dresden01109, Germany.

ACS Applied Electronic Materials
|November 28, 2022
PubMed
Summary

Hafnium oxide ferroelectric field-effect transistors (FeFETs) show improved performance with interfacial layer engineering. SiON-based FeFETs achieve 96% accuracy in MNIST handwritten digit recognition for inference tasks.

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