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Updated: Apr 12, 2026
Graphene-Assisted Quasi-van der Waals Epitaxy of AlN Film on Nano-Patterned Sapphire Substrate for Ultraviolet Light Emitting Diodes
Published on: June 25, 2020
Novel thin-GaN LED structure adopted micro abraded surface to compare with conventional vertical LEDs in ultraviolet
Yen Chih Chiang1, Chien Chung Lin2, Hao Chung Kuo3
1Institute of Lighting and Energy Photonics, National Chiao Tung University, No.301, Gaofa 3rd Rd., Guiren Dist., Tainan City, 71150 Taiwan.
Abstract:
In this study, novel thin-GaN-based ultraviolet light-emitting diodes (NTG-LEDs) were fabricated using wafer bonding, laser lift-off, dry etching, textured surface, and interconnection techniques. Placing PN electrodes on the same side minimized the absorption caused by electrodes in conventional vertical injection light-emitting diodes (V-LEDs) and the current spreading was improved. The light output power (700 mA) of the NTG-LEDs was enhanced by 18.3% compared with that of the V-LEDs, and the external quantum efficiency (EQE) of the NTG-LEDs was also relatively enhanced by 20.0% compared with that of a reference device. When the current operations were 1,500 mA, the enhancements of the light output power and EQE were 27.4% and 27.2%, respectively. Additionally, the efficiency droop was improved by more than 15% at the same current level.
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