High Pressure Resistance in Omniphobic Distillation Membranes with Re-entrant Nanostructures

Sangsuk Lee1, Omar A Laris2, Elizabeth A Hjelvik2

  • 1Department of Civil, Environmental & Architectural Engineering, University of Colorado Boulder, Boulder, Colorado 80309, United States.

Nano Letters
|April 18, 2025
PubMed
Summary

Researchers created robust omniphobic membranes for efficient distillation of low-surface-tension liquids under high pressure. These membranes maintain stability above 15 bar, advancing separation technologies.